Used TEL / TOKYO ELECTRON UX-1080 #9068938 for sale

TEL / TOKYO ELECTRON UX-1080 is a high-end diffusion furnace and associated accessories. Its main feature is a large uniform temperature profile across the firing chamber, allowing for precise temperature control of the substrate temperatures during processing. The temperature range is 0° to 1000°C and the homogeneity of the temperature profile is +/-1°C. The convection fan features a strong positive pressure, allowing for the uniform distribution of the heat across the chamber. The fan can be adjusted in two directions, enabling a diffusion process with uniform flow and temperature. The diffusion furnace is also equipped with an inert gas injection system, which circulates the inert gas evenly and helps to maintain the uniformity of the substrate concentration. The diffusion chamber is enclosed and protected inside with a heater plate for effective heat distribution. The temperature control system is designed to be highly efficient and adjustable to accommodate a wide range of applications. The programmable controller capabilities provide convenience and flexibility in setting up processing runs. TEL UX-1080 diffusion furnace also features a powerful software package which allows for computer monitored processing. The graphical user interface makes it easy to control and monitor various variables. A range of functions can be set up, including the ability to directly adjust the firing temperature, set ramp rates, dwell times, and substrate temperatures. Finally, TOKYO ELECTRON UX-1080 diffusion furnace comes with a variety of auxiliary components. These include spectral emission monitors and automatic muffle openers for easy access to the chamber and substrate. The furnace is also compatible with a number of other accessories, such as gas and liquid flow meters. These are designed to provide high quality results. In conclusion, UX-1080 diffusion furnace and accessories is a top of the line process system. Its wide temperature range and homogeneity of the temperature profile across the chamber make it suitable for a number of diffusion processes. The user-friendly software package and peripheral components make it a great choice for any research and production environment.