Used TEL / TOKYO ELECTRON UX-1080 #9276695 for sale

TEL / TOKYO ELECTRON UX-1080 is a diffusion furnace and its accessorie used for uniform diffusion of dopants such as phosphorous and arsenic to prepare high-speed device structures used in semiconductor and other devices. It is designed for superior substrate uniformity and high throughput, as the furnace is capable to deposit up to 30 group, 200 mm wafers at the same time. It also offers excellent process uniformity from the beginning to the end of the furnace. TEL UX-1080 is equipped with a horizontally located extended boat transfer furnace. It is designed with a gas-operated acceleration mechanism, which enables quick acceleration and deceleration of the boat, reducing the time required for transferring the wafer. Additionally, the top surface chamber offers heated convection with uniform, high-speed horizontal motion, allowing uniform heating throughout the process. The diffusion process in TOKYO ELECTRON UX-1080 consists of three stages: preheat, react, and cool-down. The preheat stage uses a programmable heated roller to ensure uniform wafer surface temperature and high throughput. The react stage is equipped with an inductive heating system that achieves rapid wafer temperature rise and excellent temperature uniformity, which positively affects the uniformity of diffusion. In the cool-down stage, a newly developed "Rapid Cooling System" offers excellent cooling uniformity despite high throughput due to minimized thermal gradients in the furnace. In addition, UX-1080 is suited for a variety of applications, such as diffusion bonding, gate oxidation, silicides, and selective oxidation technologies. It is also equipped with a cooling system that enables post-annealing of the wafers without the need for a separate cooling chamber. This feature is particularly beneficial when used with high-speed semiconductor devices requiring quick thermal stabilization. TEL / TOKYO ELECTRON UX-1080 diffusion furnace is ideal for the production of small-sized and high-frequency semiconductor products. Its robust design, uniform process control, low heat loss, and high-speed operation make it an an attractive option for large-scale production, providing superior quality control and repeatable results.