Used TEL / TOKYO ELECTRON UX-11P10-4HT #9198284 for sale

TEL / TOKYO ELECTRON UX-11P10-4HT
ID: 9198284
Wafer Size: 6"
Horizontal furnace, 6".
TEL / TOKYO ELECTRON UX-11P10-4HT is a diffusion furnace and accompanying accessories used in the semiconductor industry. It is used to allow the diffusion of implant gas into silicon wafers. TEL UX-11P10-4HT is a diffusion furnace that is designed with a single-wafer load lock chamber, allowing quick access and the ability to process multiple wafers in a single cycle. The outer dimensions are 1130mm (W) x 980mm (D) x 1985mm (H) and the standard maximum process temperature is 1100°C (2000°F). The furnace uses advanced POCVD (Plasma-Enhanced Chemical Vapor Deposition) technology for optimal temperature control and comparatively low thermal resistance. The accompanying software is highly advanced and enables precise control of the diffusion process parameters. The operation can be monitored from outside the chamber and is designed for easy integration with other automation equipment. In addition to the diffusion furnace, the complete set of accessories that accompany it includes a Modular Gas Box system that allows the safe handling and supply of various gases and materials. It is equipped with a thermocouple interface, allowing the user to monitor the process in real-time. The provided power supply is capable of delivering up to 4KW into the chamber. An advanced dual-waveform RF power generator is provided to ensure optimal ionizing of the chamber. TOKYO ELECTRON UX-11P10-4HT's diffusion furnace is designed for quick and easy access. It is equipped with a movable manifold mounted on the chamber lid, along with a temperature control system that delivers a constant temperature in the diffusion region of the process chamber. The chamber can be operated in different atmospheres, including helium, argon and nitrogen. Overall, UX-11P10-4HT is an advanced and efficient diffusion furnace system designed for the semiconductor industry. Equipped with its accompanying accessories and software, it fulfils all the needs of a standard diffusion process. It has been designed with both reliability and safety in mind, ensuring users peace of mind in their processes and excellent results.
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