Used TEL / TOKYO ELECTRON UX-11P10-4HT #9377249 for sale

TEL / TOKYO ELECTRON UX-11P10-4HT
ID: 9377249
Wafer Size: 6"
Horizontal furnaces, 6" Gases: H2, O2, N2.
TEL / TOKYO ELECTRON UX-11P10-4HT is a high-end diffusion furnace and associated accessories designed for use in various semiconductor applications. The complete equipment features a diffusion mainframe, a multi-user cassette tray, cassette liner, temperature sensors, and a temperature controller. The diffusion mainframe is an 8-slot platform designed to hold up to 8 cassettes of 248mm in size that are placed directly into the slots in the mainframe and secured with the use of special clamps. The cassette tray is a multi-user system designed to accommodate up to 8 cassettes of various sizes. The cassette liner aids in uniform heat distribution, preventing oxidation and facilitating temperature uniformity. This, combined with the special clamps, ensures uniform temperature across the unit so that all components of the machine reach a consistent temperature within an acceptable margin of error. The temperature controller for TEL UX-11P10-4HT is designed for accurate temperature control and control of all accessory functions throughout an entire tool and is optimized for precise control of temperature set points and speed of change throughout all essential functions. It is capable of controlling temperatures between room temperature and 1250°C. Temperature control can be achieved with three different range settings- high range (up to 550C), medium (450C and below), and low (350C and below). The temperature controller is connected to multiple temperature sensors to monitor temperature throughout the asset for accurate and detailed temperature readings. Overall, TOKYO ELECTRON UX-11P10-4HT is an advanced diffusion furnace and accessories model designed to provide precision temperature control and processing raw materials into semiconductor devices. With the special clamps, multi-user cassette tray, and temperature controller, the equipment is optimized to ensure optimum operation and yield of high-end semiconductors devices.
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