Used TEL / TOKYO ELECTRON VCF-615S #141288 for sale

TEL / TOKYO ELECTRON VCF-615S is a single-zone, vertical tube type diffusion furnace that is suitable for creating layers on high temperature semiconductor substrates through thermal oxidation and diffusion. It features an anodized aluminum chamber that is capable of handling temperatures of up to 1000°C and pressures up to 600 Torr. The unit also features TEL advanced, high-efficiency auto-insulation equipment, designed to minimize thermal resistivity and heat loss. An additional feature of this model is its high-speed heating system, capable of creating layers with thicknesses of up to 8,000 angstroms in less than one hour. TEL VCF-615S diffusion furnace contains a main chamber for processing substrates, a cooling mechanism for the main chamber and a cooling mechanism for the anode rod. The main chamber is a vertical stainless-steel diffusion tube that has a diameter of 6" and a height of 24". The high-temperature furnace is heated by a DC heater, and an anode rod has been added to enable a uniform heating rate and temperature. Heated hydrogen is introduced into the main chamber, and the temperature is controlled by varying the flow of heated hydrogen. A variety of accessories are available with TOKYO ELECTRON VCF 615S diffusion furnace, including a temperature monitoring unit and higher pressure control devices such as a manometer and pressure gauge. The temperature monitoring machine allows for accurate temperature readings at all times, while the higher pressure control accessories enable accurate deposition rates by allowing the user to control both the temperature and the pressure. In addition to these features, VCF 615S diffusion furnace has been designed with an additional safety feature which can prevent oxidation in the main chamber if the pressure drops too low. This is accomplished by introducing nitrogen into the chamber and monitoring the pressure using a manometer. This diffusion furnace can be used for a variety of processes such as silicon wafer oxidation, crystal growth, defect reduction, source and drain drug process, and other related processes. VCF-615S diffusion furnace is an efficient and reliable tool for creating high quality layers on semiconductor substrates. The versatility of this model and its high-speed heating tool make it an ideal choice for a variety of applications. Additionally, the safety feature, temperature monitoring asset, and pressure control accessories make this model a safe and effective choice for creating layers with tight tolerances and accurate results.