Used TEL / TOKYO ELECTRON VCF-615S #293747447 for sale

TEL / TOKYO ELECTRON VCF-615S is a diffusion furnace and accessory used in the industrial process of creating semiconductor devices such as devices for computer chips, solar cells and transistors. The diffusion furnace employs thermal diffusion processes for doping semiconductor substrates with different elements (primarily boron and phosphorus) needed for production. This is a quartz process tube with a length of 1,600 mm and a width of 166 mm capable of working at a maximum temperature of 1250 degrees Celsius, and is used in the processes of implanting, diffusing, annealing and thermal oxidation. The high thermal inertia offered by TEL VCF-615S diffusion furnace makes it an ideal miniaturization equipment for the high current making of miniature components. The effectiveness of the diffuse furnace is not only about its high thermal inertia, but also about its precision and reliability, as well as its low per unit cost. It also affords maximum process control in terms of temperature uniformity, high heating rate, and the ability to set temperatures accurately and quickly. The furnace also comes with a thermocouple system capable of actively regulating process temperatures, a full range of control systems for diffusion times and rates, and integrated background gases (Ar and H2). Moreover, its gas measurement unit is equipped with safety features for preventing contamination of the process tube, as well as for avoiding any build up of hazardous levels of gas in the machine. In addition, TOKYO ELECTRON VCF 615S offers integrated vents that ensure process gases disperse quickly and avoid risk of hazardous levels of build up. The unit has a three-layer Ni-Pt insulated aluminum chamber, and the protective -layer chamber provides safety at all times. The furnace also assures resistance to high temperature and thermal shock. Moreover, the quartz chamber has a surface finish that ensures good module contact. TEL / TOKYO ELECTRON VCF 615S diffusion furnace and accessory are a reliable and robust device that can offer effective and accurate doping of different elements needed for the creation of semiconductor devices. Equipped with a wide range of features such as thermocouple systems, control systems, background gases, process gases, a protective layer chamber, and Ni-Pt insulated aluminum chamber, this diffusion furnace offers a powerful and reliable solution for semiconductor creation.