Used TEL / TOKYO ELECTRON VCF615C #9137186 for sale

TEL / TOKYO ELECTRON VCF615C diffusion furnace and accessory is a specialized tool used for the deposition of planar or non-planar structures with precise positioning accuracy and reliability. This equipment is particularly useful for semiconductor manufacturing and development. TEL VCF615C system comprises a process chamber, a transfer robot, a Transporter, and an Enhanced Substrate Transfer Unit (ESTS). The process chamber is designed with an architecture that is conducive to processing larger substrates and offers low contamination levels. The transfer robot is equipped with a stepper motor and a direct drive machine to ensure smooth and reliable motion for transferring substrates between the chamber and the Transporter. The Transporter is a high-speed loading tool that is capable of holding large amounts of substrates and providing rapid loading/unloading of the substrates. Finally, the ESTS provides fast and precise alignment of the substrates. The asset offers a wide range of substrate capabilities including wafers in sizes from 3 to 12 inches, as well as metal foils and tape carriers. TOKYO ELECTRON VCF615C also offers optimal process control with local and remote support. It is also compatible with an array of optional features, such as in-situ endpoint detection and real-time monitoring of process parameters. These features are provided via TEL Process Data Analysis Model (PDAS). VCF615C also has a number of safety features to protect against malfunctions, including open/close limit switches and reduced pressure safety systems activate as soon as the normal pressure in the chamber is exceeded. Additionally, it is designed for ergonomic operation with a powerful, programmable touch screen and tiltable LCD monitor. In summary, TEL / TOKYO ELECTRON VCF615C diffusion furnace and accessory is an advanced equipment designed for efficient and reliable diffusion processing of planar and non-planar structures. It offers high throughput in a clean and safe working environment with a range of advanced substrate capabilities for semiconductor manufacturing and development.