Used TEL / TOKYO ELECTRON VDF 615 #9226260 for sale

TEL / TOKYO ELECTRON VDF 615 is an advanced semiconductor processing and manufacturing tool used in the fabrication of various devices. It is a vertical diffusion furnace (VDF) with an integrated active atmospheric control equipment, the VC-ACTS. TEL VDF 615 allows for precise process tempering and fast thermal gradient control. It is used to introduce dopants into a silicon wafer, enabling higher material properties and device performance. The furnace features an isolated chamber, where the walls and base are sealed against the environment. This ensures that no air or other contaminants can enter the chamber and affect the purity of the process. The insulation material surrounding the chamber helps maintain an even temperature throughout the chamber. The heater elements are located in a box-like structure at the top of TOKYO ELECTRON VDF 615 and are designed to evenly heat the chamber. This allows for uniform temperature throughout. VDF 615 also features an active atmospheric control system known as VC-ACTS. This unit is comprised of a heated circulation machine and a vacuum-pumping mechanism. The heated circulation tool evenly distributes the dopant into the chamber while the vacuum-pumping mechanism lowers the atmospheric pressure. This ensures uniform atmospheric control, resulting in fewer contaminants entering the chamber and better process yield. An independent accounting asset, called the PIII6, is integrated into TEL / TOKYO ELECTRON VDF 615. This model tracks and stores all process parameter values in a computer. This allows for easy comparison of current and historical data as well as efficient memory management. All data can be stored for up to 2 years and accessed remotely via the internet. TEL VDF 615 is widely used in the semiconductor industry for various processing applications. It offers reliable, repeatable and accurate performance. The integrated active atmospheric control equipment and PIII6 accounting system make this tool a reliable and user-friendly choice for the semiconductor industry. This diffusive furnace is designed to produce high-quality products and its continual control of the atmosphere provides consistent results.