Used TEL / TOKYO ELECTRON VDF 615T #178007 for sale

TEL / TOKYO ELECTRON VDF 615T diffusion furnace is a reliable, advanced-level tool used for semiconductor substrate processing. Its extensive capabilities include high-temperature oxidation, nitridation, and thermal processing. The furnace is composed of an aluminum chamber, two heating zones, two cooling zones, a gas panel, two gas manifolds, a wafer transfer arm, and an antechamber equipped with a 100mm sample heating cartridge and various accessories. The furnace chamber is made of corrugated metal to ensure maximum thermal efficiency. It has two independently-controllable heating zones and two cooling zones. The first heating zone is used to regulate temperature during processing, while the second zone is used to preheat materials prior to diffusion processing. Both zones are operated by external controllers with PID type controllers as well as precision temperature sensors. It also features a high-performance Pomega burner system and a Hi-Velocity Diesel low NOx burner with low radiation emissions. The gas panel is designed to supply argon, nitrogen, and hydrogen to the chamber. It regulates gas flow, pressure, temperature, and composition with the help of two gas manifolds. It also includes a mass flow controller for accurate control of gases. The wafer transfer arm is a pneumatically-operated action arm used to transport substrates in and out of the furnace. It consists of two linked arms, one vertical and one horizontal, with a wafer clamp fixed at the intersection. It is controlled by a programmable motorized system and is equipped with a cooling line for rapidly moving heated substrates. The antechamber is equipped with a 100mm sample heating cartridge and various accessories. The sample-heating cartridge, which uses a six-zone refractory heating element, can heat samples up to 900°C. It also features a heater sensor to measure the heater's temperature. The accessories include a 26-channel pyrometer, a gas flow control unit, a pressure regulator, a vacuum gauge, and various vacuum valves. TEL VDF 615T diffusion furnace is a reliable, advanced-level tool with numerous features that make it suitable for semiconductor substrates processing. It is constructed of high-quality materials and components, which ensure precise and stable temperature control. Its extensive capabilities make it a great choice for semiconductor processing applications.