Used TEL / VARIAN 200SJ #293608156 for sale

TEL / VARIAN 200SJ diffusion furnace is a piece of advanced equipment with a wide range of vital applications in the field of semiconductor fabrication. This diffusion furnace has a unique construction which allows for greater temperature uniformity, higher production rates, and greater control over the finishing processes for diffused layers. Additionally, TEL 200SJ features accessorial components like the quartzite dry etch equipment and the hydrogen reduction option which allow for further precision in the fabrication process. The quartzite dry etch system allows for a more controlled dry etching procedure which is essential for producing superior diffused layers from thin-film materials. This unit uses high temperatures to evaporate and deposit isolated thin-film quartzite layers. Additionally, the high dimensions of this machine allow for larger layer evaporation and deposition rates than other diffusion furnaces. The hydrogen reduction option utilizes hydrogen pre-annealing treatment to further improve the quality of thin-film diffused layers. This option allows the process parameters to be internally regulated and thereby produces the most accurate and precise results. VARIAN 200SJ diffusion furnace features advanced construction which provides greater temperature uniformity and optimal production rates. It is equipped with a low-emission tubular vertical design which allows for uniform temperature distribution along the full length of the process chamber. Additionally, 200SJ has a split shower design which helps maximize the diffusion process by ensuring that the process gas is evenly distributed throughout the entire chamber. The accompanying gas box and access port help regulate and monitor the flow of process gases. TEL / VARIAN 200SJ diffusion furnace is an extremely well designed piece of equipment with several advanced features which allow for greater precision and accuracy in the fabrication process. This furnace is able to work at high temperatures to evaporate and deposit thin-film quartzite layers in uniform condition. Additionally, the accompanying quartzite dry etch tool and hydrogen reduction option give further precision and allow for the most optimal results in diffused layers. Ultimately, this diffusion furnace is a crucial tool for the production of diffused layers in the semiconductor industry.