Used TEMPRESS 270 #2700 for sale

TEMPRESS 270 is a diffusion furnace that is suitable for semiconductor and industrial heat treatment applications. 270 is a solid state, diffusion furnace that utilizes a low thermal conductivity SiC insulation material to ensure high temperature uniformity. Built with durable, metal components and an all inclusive controller, TEMPRESS 270 offers precise control of temperature, heating rate, and cooling rate. 270 utilizes top and bottom heating elements, which have been designed to optimize energy efficiency. An energy-saving three-zone, two-channel power supply provides precise control of temperature, heating rate and cooling rate. The tightly controlled within-zone temperature gradients allow for accurate, repeatable, and consistent heat treatment. TEMPRESS 270 also offers various temperature ramping capabilities, allowing users to customize the heating and cooling profile for different applications. 270 is equipped with a comprehensive PID controller that performs advanced functions, alleviating user workload. The equipment also includes a large, full-color touch screen interface and a data-storage system for record keeping and exporting. The interface is designed to be easy to use, allowing users to quickly and effortlessly monitor and adjust temperatures. The unit's multiple furnace chamber temperature zones allow for fast and efficient processing of multiple substrates. The internal chamber of TEMPRESS 270 has been designed with an internal servo-driven conveyor belt insulation machine, which serves to prevent contamination to process materials. The conveyor belt tool is mounted on top of a spring-loaded suspension asset, which prevents buildup of contamination within the processing chamber. This insulated chamber provides the necessary diffusion temperatures up to 2000 degrees Celsius while maintaining low chamber pressures of up to 0.1 torrs. 270 also includes a wide range of accessories to optimize the process. An integrated venting model ensures that any excess furnace exhaust fumes are removed to the outside environment. An advanced cold-wall cooling equipment, protects the processing chamber from external heat-loss and helps maintain process temperature profiles. Additionally, TEMPRESS 270 offers precise process control over the upstream oxygen fill makeup and downstream inert gas delivery. The inert gas stream helps to provide the precise atmosphere control by providing an ultra-low background concentration of oxygen and other contaminant gases. Overall, 270 is an ideal diffusion furnace for semiconductor and industrial heat treatment applications. With precise control of temperature and heating/cooling rates, it provides optimized heat treatment with minimal contamination. The varied range of additional features, enables precise process control to ensure consistent performance across a range of materials and substrates.