Used THERMCO 4500 #59757 for sale

THERMCO 4500 is a diffusion furnace and accessory designed to provide a reliable, low-vacuum, high-temperature environment for semiconductor and thin-film processing applications while providing increased safety and long-term reliability. This advanced diffusion furnace enables highly complex, multiple process-step modules to be configured and operated as a single system. 4500 features a patented stainless steel thermal chamber with integrated quartz elements providing up to a 1200°C uniform temperature profile. The system delivers higher levels of reproducibility and decreased temperature non-uniformity compared to traditional glass tube furnaces. It also provides exceptional temperature uniformity across the range of temperature (1200°C +/-20°C). Moreover, the dual-zone tube housing design of THERMCO 4500 allows direct access to the heat zone and cooling zone at the same time. 4500 is designed for processing thin-film and semiconductor wafers with a variety of optional components including quartz crucible, quartz boat, and thermo-shields. Its advanced controller offers precision process control with a PID regulation process feedback and manual or auto temperature mode. The fully insulated chamber ensures high efficiency and low thermal gradient which makes the process repeatable and reliable. Additionally, THERMCO 4500 also includes advanced safety features such as a pressure intrusion switch, temperature intrusion switch, and integrated flame detection system. The standard power supply used in 4500 is 220/480V, 3-phase 50/60Hz while the maximum power input is 36KW. The internal dimensions of the furnace are 400mm*400mm*500mm (L*W*H) and the recommended gas pressure is 5 Torr. The advanced controller comes with an 8.4-inch LCD display with Windows 7-based software for installation and operating control. The controller also supports temperature control, programming, data logging, and fault detection. In terms of maintenance, the suggested maintenance interval for THERMCO 4500 is 12 months or 2000 hours of operation. It is designed to provide precision temperature and pressure control and a reliable diffusion process in a variety of specialized materials processing applications such as manufacturing of solar cells, advanced semiconductor chips, and thin film coatings. Its advanced safety features and high temperature capacity make it one of the most reliable and versatile diffusion systems available for the semiconductor and thin-film industry.