Used THERMCO 5100 #9134801 for sale
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ID: 9134801
Wafer Size: 6"
Horizontal furnace, 6"
Process temperature: 1150–1200 Celsius
(4) Tubes
Voltage: 415V 3Ph 50 Hz
EMO: No
Config (see system layout): H
Model: 5200
Heating element:
Model: MRL-3S, HC-61
P/N No:
0440817770 R03 (Tube 1)
0440817770 R02 (Tube 2-3)
0440817770 R01 (Tube 4)
Tube size : 225 / 235 mm
Water cooled heat exchanger / Position: Yes / Top mounted
Thermocouples: B Type
(3) Controlled zones
Over temp monitoring: Over temp board
Load station (L/S)
Model: 5200
Boat loader type: D2
HLF Air supply: Low blow
Blower power: 220V 50Hz
Hepa filter type: ULPA class 1.2 µ
Hepa filter access: Rear
Scavenger boxes: 12" Square
Head assembly: Cryco
Cantilever type: Paddle (2" Square handled)
Exhaust position / Connection: Upward / 7" x 7" Sq
Source cabinet (S/C)
Model: 5100
Gas manifolds: Upward
Exhaust position / connection: Upward / 4" x 7"
External torch: Low flow / Air cooled
Source heater: MRL P/N: 4000799600
Bubbler: Schumacher STC DCE
Process gas: Regulated and filtered
CDA: Regulated
Regulator: Aptech
Gauge: Celerity
Filter: Mykrolis
Gas inlet location: Top (Bulkheads exhausted)
Valve: All nupro diaphragm
Computer console (C/C)
Controller: Tmx 1.8.60
SBC Compliant: Yes
Miscellaneous
Straight Cables: Yes (ALL)
Elevator: No
Gas MFC Range
N2 20 SLPM
O2 20 SLPM
H2 20 SLPM
O2Lo 2000 SCCM
N2C 500 SCCM (Tube 1)
- 1000 SCCM (Tube 2)
- 1000 SCCM (Tube 3)
- 1000 SCCM (Tube 4)
O2 500 SCCM.
THERMCO 5100 is a diffusion furnace and associated accessories specifically designed for high purity wafer processing applications. It is engineered to provide superior thermal uniformity and performance, creating an ideal environmental for delicate wafer processing. 5100 series features a large load capacity in an efficient and compact design. THERMCO 5100 series also features an automated wafer elevators, which enables the user to easily load and unload wafers from the furnace without manual assistance. The diffusion capabilities of 5100 series allow for superior film characteristics in a variety of applications, such as low-temperature oxidation and nitride, diffusion processes for wafer level packaging, and epitaxial layer deposition. The furnace's efficient and compact design relieves strain on the operation, allowing for fewer reconditioning cycles and shorter turnaround time. Its tight thermal uniformity of +/-2 degrees Celsius coupled with its improved performance due to its low power consumption, conserves both energy and resources, producing less waste. Thermal uniformity is ensured through the system's unique vertical side wall hot zone design, which evenly distributes heat within the entire chamber and helps keep an optimal temperature throughout the wafer. THERMCO 5100 series also includes an advanced variable power capacity, allowing users to switch voltage and wattage, ranging from 120V to 240V and 100W to 2000W, depending on the requirements of the process. This variable power capacity maintains precision and thermal stability while providing added energy efficiency. 5100 series is designed for safety, with a finely tuned electro-mechanical interlock system, which prevents entry of unwanted objects into the furnace during operation. The system also features an insulated thermal switch that helps maintain safe temperatures during operation and prevents any excess heat from radiating to the outside. Finally, THERMCO 5100 series is designed for convenience, with a cycle programming interface that allows for repetitive processing, as well as the ability to save custom cycle recipes for easy retrieval and future applications. 5100 series is a well-designed, reliable, and efficient diffusion furnace and associated accessories that is suitable for many wafer processing applications. It offers superior thermal uniformity and performance, ensuring precise wafer processing at a fraction of the cost and time associated with other methods. THERMCO 5100 series will ensure quality and reliability in any of your wafer processing needs.
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