Used TOYOKO CHEMICAL UHTV-4200T #9296623 for sale

ID: 9296623
Wafer Size: 3"
Oxidation furnace, 3" Type: Vertical SiC with 1350°C Does not include Nitrogen gas purifier.
TOYOKO CHEMICAL UHTV-4200T is a diffusion furnace specifically designed for high-temperature annealing of electronics. This floor-standing high-temperature vacuum-capable furnace features separate annealing chambers with precision controllers that can be set to different temperatures for accurate annealing. It uses clean inert gas for purging and has an electronic controller with a large easy to read digital display. UHTV-4200T is designed for high-precision annealing applications, such as for manufacturing ultra-fine materials. It has a range of heating rates that can be adjusted by the user to suit specific applications and the accuracy of the temperature rate can be adjusted to the nearest 0.1°C. This allows for accurate annealing at various temperatures. The diffusion furnace is equipped with a triple-mirror radiation protection equipment that provides insulation against harmful radiation and ensures optimum safety during annealing. The chamber is also equipped with expandable ceramic hot lids with air ventilation, reducing heat energy loss. The insulating elements of gypsum permit more uniform temperature in the inner parts of the chamber. TOYOKO CHEMICAL UHTV-4200T is designed to reach a maximum temperature of 2000°C, while offering excellent temperature control and stability across the entire useable temperature range. For optimal performance, UHTV-4200T is equipped with a satellite cooling system and a vacuum sealing unit. The cooling machine prevents any variations in the stability of the temperature, resulting in a more precise temperature change and a higher annealing efficiency. The vacuum sealing tool removes phosphorous and sulphur, which are accumulated after annealing, from the chamber. TOYOKO CHEMICAL UHTV-4200T also features a gas-tight door that prevents gas leakage and provides excellent insulation against heat, resulting in improved performance. The diaphragm pumping asset used in UHTV-4200T is designed for reliable operation and long-term performance. It provides high precision control and faster operation for improved uniformity. The diaphragm pumping model can also be used during annealing, eliminating the need to carry out additional steps before and after annealing. This allows operators to effectively control purge frequency and gas flow rates. TOYOKO CHEMICAL UHTV-4200T has an easy to clean interior chamber, featuring an advanced design and easy-to-access removable panels. This helps to keep the chamber in optimal condition, and also encourages frequent cleaning before and after annealing. Numerous safety and protection features are built into the design, and it includes a high pressure shut-off equipment that provides interruption of the gas flow at temperatures higher then the set limit. This helps to protect components from overheating and damage. UHTV-4200T diffusion furnace is the ideal solution for precise annealing applications, providing precise temperature control, exceptional safety features, easy maintenance, and optimised performance.
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