Used ULVAC V10-100LC #9373107 for sale

ULVAC V10-100LC is a diffusion furnace and accompanying accessories for semiconductor manufacture. It is a tool used, often in laboratories, to introduce compounds or dopants to the semiconductor surface in order to modify its properties. V10-100LC is specifically designed for the Low Pressure Chemical Vapor Deposition (LPCVD) process. This is a process in which a gas phase reaction is used to deposit a thin film over the surface of the material. ULVAC V10-100LC is a horizontal, single wafer stealth diffusion furnace that can handle large volume uniformity demands. It offers precise control of temperature and atmosphere with computer-controlled accuracy. It also yields high throughput, uniformity, excellent repeatability and can be operated in either a closed-loop or open-loop mode, to ensure low generation of particles. The main components of V10-100LC are the quartz boat which holds the wafers and the vacuum-chamber. It is equipped with a range of safety features and temperature-sensitive elements to prevent any unwanted thermal changes. The system also includes a powerful heating element and controller, allowing for precise temperature control with a desirable uniformity across the chamber. It also features semi-automatic thermal control, which can be adjusted for various process parameters such as pressure, temperature, and time. ULVAC V10-100LC is designed with a variety of advanced design features as well. These include multi-point sensors, real-time process control, multiple recipe capability, and an advanced user interface to ensure an easy-to-use environment. V10-100LC is designed with a high degree of flexibility to accommodate various process requirements. ULVAC V10-100LC is a reliable, efficient, and easy-to-use system that provides superior performance for the diffusion of dopants on semiconductor surfaces. It produces highly accurate results, offering excellent uniformity and repeatability for wide range applications for the manufacture of semiconductor devices.