Used VERTEX DJ-802V-H #293652809 for sale

VERTEX DJ-802V-H is a diffusion furnace and accessories designed to be used in the manufacturing and processing of semiconductor wafers. The furnace is designed to provide controlled oxidation, drive-in, annealing and other related processing operations in the fabrication of electrical components. It achieves this utilizing an advanced airtight and dual-wall construction. The main chamber of DJ-802V-H is a rectangular-shaped jacket with a high-grade oxidation-resistant coating to ensure a long life. The chamber measures only 830×530mm and is equipped with a unique three-part porcelain fiber insulation equipment to ensure optimal thermal efficiency and effective temperature control. The maximum operating temperature is 1250°C and its furnace insulated walls are capable of maintaining excellent uniformity and accuracy. VERTEX DJ-802V-H features a special heating system with advanced air flow and electric heating with 24 high-temperature electric elements giving the operator full control to adjust the temperature profile according to their process. Furthermore, the structure is designed to provide an even gas flow which allows the operator to precisely adjust the temperature of each heating element. DJ-802V-H is equipped with a unique and innovative gas unit. It consists of two gas manifolds and a bypass gas circuit, providing both high stability and large gas throughput for any process. The furnace chamber is equipped with a high-efficiency exhaust machine that is designed to rapidly remove reaction gases to prevent contamination and oxygen depletion. Additional equipment is included for this tool to help with uniformity and accuracy in the diffusion process. It includes quartz inner plates and wafer holder, wafer positioner, cooling tray and related accessories. The asset is also compatible with a wide range of thermocouple types for real-time temperature readings. The software included with the model also allows for easy programming by the operator. VERTEX DJ-802V-H is an advanced diffusion furnace and accessories designed to meet the most stringent semiconductor wafer processing needs. Its airtight and dual-wall construction is designed to ensure optimal thermal efficiency and accuracy, while its gas equipment is designed to provide both high stability and large gas throughput. Its advanced software and accessories make it a valuable addition to any process and allows operators to easily program it for the desired process.