Used HORIBA / JOBIN YVON UVISEL #149667 for sale

HORIBA / JOBIN YVON UVISEL is a state-of-the-art Vector Spectroscopic Ellipsometer (VSE) developed for measuring thin films and other materials over a wide spectral range from ultraviolet to infrared. The instrument is designed for non-destructive thin film thickness, optical constants, scattering and film uniformity measurements. By measuring optical characteristics of a thin film over an extended range, it can determine properties of interface layers and their composition. HORIBA UVISEL utilizes a rotating polarizer and an analyzer to measure the changes in light intensity at varying wavelengths in the device's spectral range. The polarization between the light source and the sample is modified to measure the surface and interfacial layers' optical effects before and/or after they are reflected back. This is an advantage of vector spectroscopic ellipsometry as it allows for thin film characterization without the use of complex sample preparation. The modulation of the incident polarized light is performed in a way that it can measure the complete spectral ellipsometric information of the sample. The complete spectra can be measured within the visible, near-ultraviolet, and the mid-infrared regions with a spectral resolution of 0.5 nm and a dynamic range of up to six decades. The angular resolution of the device is 0.004°, which is used to measure the dynamical range with a better accuracy. The main components of JOBIN YVON UVISEL include an XYZ stage, advanced optics, detector array, acquiring electronics, and computer control. The XYZ stage provides three-dimensional translational control of the sample, while the advanced optics uses laser interferometry for improved spot size accuracy and scan speed. The system is equipped with a detector array to measure the intensity of radiation for every wavelength over the spectral range. The data is acquired with a high-speed integrating system, and the results are controlled through a computer. UVISEL is the ideal instrument for accurate thin film characterization, from single layer thickness measurement of coatings on electronic components and metals to film thickness measurement of optical substrates and optoelectronic components. It is also used for optical properties of thin films such as dielectric constants and absorption coefficients, as well as anisotropic material properties. The system is widely used in industries where advanced thin film characterization is a must, such as semiconductor, automotive, and medical device manufacturing. This makes HORIBA / JOBIN YVON UVISEL a versatile tool for widespread research applications.