Used RUDOLPH FE III #9165606 for sale
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ID: 9165606
Wafer Size: 6"
Vintage: 1995
Wafer thickness measurement system, 6"
1995 vintage.
RUDOLPH FE III is an automated, computer-controlled, optical metrology instrument designed to measure thin film thickness, refractive indices, as well as other properties of thin films. This ellipsometer is a non-destructive analytical tool built using a HeNe laser light source, a combination of two rotating analyzers, as well as a detector. The laser measures the phase change and energy shift in the reflected light from an optically flat substrate and passes it through a rotatable compensator and analyzer where it is split into two beams of equal amplitude. This combination of polarizing elements reflects and transmits the light in the direction of the detector creating a measurable ellipsometric signal. The detector then converts the ellipsometric signal into a voltage signal that is recorded and processed by the data acquisition system that can report the film thickness, refractive indices, and other properties of the thin film. The data acquisition system also has an LCD display to view the recorded information and has an external printer port for results to be printed or saved to a file. RUDOLPH FEIII also comes with a software driven user interface that allows for the automatic set up, operation, and control of the ellipsometer instrument. The software can be tailored to change the analyser angles, laser intensity, laser wavelengths, ellipticity angles, and many more settings to get the desired information. The measurement parameters can also be set to get increased accuracy. The software also enables the user to obtain multiple readings of the sample substrate and can store, analyze, and retrieve the data. Furthermore, calibration is efficient in FE-III as users can utilize various internal calibration standards or utilize external substances. The reliability, flexibility, precision, and accuracy of FEIII makes it an ideal instrument for a variety of thin film testing applications such as optical components, semiconductors, solar cells, and more. The intuitive user interface, automated features, and integrated system design all make FE III an excellent choice for a wide range of applications.
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