Used RUDOLPH FE IV #9271610 for sale
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ID: 9271610
Wafer Size: 8"
Vintage: 1995
Thickness measurement system, 8"
1995 vintage.
RUDOLPH FE IV is an advanced ellipsometer designed by RUDOLPH Technologies, Inc. It is a powerful analytical tool designed to measure the optical properties of materials such as thin films and small particles. The instrument is equipped with a range of sophisticated features, including a unique, large-area sample chamber for high-speed measurements and a custom-designed computer-controlled drive equipment which allows for fast scanning of samples. The instrument is composed of an optical system with a wavelength range of 350 to 1650 nm, a sample stage, and a high-speed computer-controlled drive unit. A single beam of light, typically from a xenon light source, is incorporated into the optical machine and directed onto the sample stage where it is transformed into an incident wave and a polarized reflected wave. The reflected wave is then detected by a CCD camera, and the angle of polarization is measured. The detection tool converts the detected information into an intensity and phase map which is used to compute the elements of the Mueller matrix. This matrix is generated in a 2x2 or 4x4 format, depending on the model of the ellipsometer, and is used to calculate the optical parameters of the sample. The data acquired can then be viewed for analysis and further manipulation using specialized software packages such as RUDOLPH EllipsWerks software. Using RUDOLPH FE-IV ellipsometer, users can accurately measure the effects of light scattering on materials, such as total reflectance, extinction coefficient, optical absorption, refractive index, coating thickness, and optical anisotropy. The large sample chamber also allows for rapid measurement of film topography and stress. In addition, the instrument can be used to measure the properties of non-transparent samples such as metal dots, making it suitable for a range of research applications in a variety of industries. Furthermore, the instrument is characterized by its simple operation and minimal user involvement, allowing users to quickly and accurately measure a variety of samples with minimal training. Its high accuracy, ease of use, and range of features make FE IV ellipsometer a powerful tool for both research and manufacturing environments.
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