Used RUDOLPH FE VII #293830957 for sale

Name: RUDOLPH FE VII
Brand: RUDOLPH
SKU: 293830957
Availability: InStock

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Ellipsometers

Manufacturer

RUDOLPH

Model

FE VII

ID: 293830957

Vintage: 1999

Thickness measurement system Process capability: 11 µm, 13 µm, 15 µm, 18 um, 25 µm, 35 µm Light source: HeNe laser: 632.8 nm Laser diode: 780 nm Spot size: Test site: 12x24 µm De-skew: 125 µm Site by site: 50 µm Pattern recognition: Optional pattern recognition Edge / gray scale detection Manual / auto de-skew Reteach Wafer handling: 3-Axis robots (3) cassettes: 100mm to 200mm Pre-aligner: Virtual flat / notch finder X, Y Centering: ±50 μm Theta: ±0.1° De-skew: ±5 μm Stage: Accuracy: 7 μm over 200mm Repeatability: ±1 µm 1996 vintage.

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RUDOLPH FE VII is a modern ellipsometer designed to measure the optical properties of thin films and multilayer stacks. It is a versatile tool for thin film characterization, production control, solar cell research and quality control, as well as for R&D in thin film deposition. RUDOLPH FEVII is equipped with a high-resolution imaging system including an optical head and a high-precision XY stage. This, combined with a bright LED light source, makes it possible to measure thin film properties at any angle of incidence. The thin film properties are obtained directly from the data gathered by the ellipsometer. FE-VII uses a unique single source, dual detector method to measure the intensity of the light reflected on the surface of a sample simultaneously at two different angles of incidence. With this method, the refractive index, thickness and optical constants of a sample can be easily determined. The ellipsometer also offers a wide range of applications such as thin film and large area characterization, solar cell analysis and wafer-level optical measurements. FEVII can be used for a variety of thin film materials and ranges from visible to far-infrared (NIR-NIR) wavelengths. The thin film thickness range is from 0 to 5000nm, and the resolution is as low as 0.1nm. Furthermore, measurements for a wide range of complex optical coefficients of thin films and multilayer stacks can also be performed. In addition to its innovative single-source dual-detector design, FE VII features a temperature-controlled XY stage which makes temperature dependent measurements possible. The optical set-up compensates environmental influences such as thermal drifts and minimizes the influence of specimen misalignment. RUDOLPH FE-VII is the perfect tool for research and development of highly precise production processes or for quality control and diagnostics of opto-electronic devices with thin film layers. It is a user-friendly and accurate solution for measuring optical constants and thin film properties.