Used RUDOLPH WaferView 220 #9130026 for sale

RUDOLPH WaferView 220 Ellipsometer is a highly precise and accurate instrument used for determining the thickness, composition, and optical properties of thin films and other optically active materials. It is designed to measure changes in optical constants that are less than 1 percent with consistently high resolution. WaferView 220 has a modular design that allows for easy integration into other laboratory equipment, as well as a built-in software package to streamline analysis and provide detailed, reliable data. RUDOLPH WaferView 220 uses a patented patented WaferView Image Acquisition Equipment (VIAS) to capture images of a sample surface at the submicroscopic level. These highly detailed images are then digitally analyzed to provide information about the size, shape, refractive index, layer thickness, composition, and structure of the sample. This process allows for extremely accurate measurements, down to one proton layer in thickness. WaferView 220 is equipped with a computer-controlled stage, which allows the user to rotate and position the sample during analysis to any desired angle. It also features an advanced vertical spectral imaging system (VSI), which captures precise measurements of the sample across a range of wavelengths, from the ultraviolet to the near-infrared. This unit is designed to provide accurate and consistent data even when measuring very thin films. RUDOLPH WaferView 220 can be used for a range of experiments and applications, including measuring film quality and thickness; determining dielectric and optical constants; characterizing semiconductor surfaces; and measuring the optical behavior of coatings, films, and layered media. It is also suitable for use in semiconductor, optics, thin film research, or any other application where the ability to measure minute variations in optical properties is important. WaferView 220 is an intuitive and powerful machine offering a range of functions and capabilities, allowing researchers and scientists to quickly and accurately measure the optical properties of thin films and other optically active materials. It provides precise, reliable data analysis and is an essential part of any laboratory, research center, or production facility.