Used SENTECH Senduro 300 #293644159 for sale

SENTECH Senduro 300
Manufacturer
SENTECH
Model
Senduro 300
ID: 293644159
Wafer Size: 8"
Vintage: 2008
Ellipsometer, 8" 2008 vintage.
SENTECH Senduro 300 is a state-of-the-art ellipsometer for thin film metrology. It is designed to measure layer thickness, composition, density, and other material parameters with exceptional accuracy and precision. The device utilizes multiple advanced optical principles to measure the polarization state of a sample in the infrared and visible range of the spectrum. The optical configuration of Senduro 300 contains both a high-precision piezoelectric goniometer and an interferometric polarimeter. The goniometer is used to precisely rotate the sample and deliver an angle-dependent analysis of the external ellipsometry parameters. The appropriate angle of incidence is chosen according to the material under investigation and the two-angle polarimeter is used to derive the optical constants, such as refractive index, extinction coefficient, and complex dielectric function. SENTECH Senduro 300 is capable of realizing very high accuracy and is further characterized by fast, non-contact measurements. The sample positions are adjusted using an integrated manual stage and a built-in motorized stage. The latter is equipped with controller and a laser pointer, allowing for precise alignment of the sample surface. In addition to providing superior accuracy and speed of measurement, Senduro 300 is also equipped with several advanced software functions. For example, the ellipsometer includes an automatic temperature control and temperature compensation system, which ensures consistent results over a wide temperature range. Moreover, SENTECH Senduro 300 incorporates sophisticated multi-layer analysis tools and a variety of report pictures as well as graphical representations. Thanks to its advanced optics, precision-movable stages, and powerful software, Senduro 300 is an invaluable characterization tool for thin film materials. It allows for highly accurate and repeatable measurements of layer thickness, composition and density, as well as a wide variety of other parameters. This makes it a valuable instrument for quality assurance in semiconductor and optical device manufacturing.
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