Used TECHNICAL INSTRUMENT COMPANY KMS 310 #9117073 for sale

TECHNICAL INSTRUMENT company KMS 310 is a highly advanced, 0.25 nm wavelength ellipsometer designed for research and development applications in the fields of semiconductor metrology and laboratory work. It has been designed to offer a high degree of accuracy and repeatability when measuring thin film thickness, layer composition, refractive indices, and other optical parameters. KMS 310 features a fully automated 4-axis design for the highest levels of precision. This allows ellipse parameters to be accurately monitored over a wide angle range with great speed and consistency. The instrument is also capable of analyzing frequency-to-wavelength services and multiple beam techniques to measure reflection data over an extended range. TECHNICAL INSTRUMENT company KMS 310 is powered by an internal spectrometer that provides users with an accurate and reproducible optical data set over the entire range. The integrated PEEK lateral scan stage captures accurate 3D ellipsoid reflectivity mapping of the entire film stack. This allows accurate optical assessment of thin films and thin film properties during new film deposition and development. KMS 310 provides superior performance for demanding optical based metrology processes. The direct aspect ratio reading is improved with the inclusion of an MCVD (Multiple Channel Ellipsometer with Variable Measurement Delay) technology. MCVD allows variable measurement of up to four wavelength positions in a single measurement cycle, with angle-resolved analysis becoming available down to 0.1°. This powerful technology allows users to analyze film stacks from the sub-nanometer range right up to the sub-millimeter range with incredible accuracy. TECHNICAL INSTRUMENT company KMS 310 provides everything an instrument user needs for research and development of thin films and layers in the laboratory - higher angle resolution, improved accuracy on thinner films, faster time to result, improved surface analysis, and much more. Its high repeatability and accuracy make it an ideal tool for nanofabrication-related laboratories and semiconductor industry laboratories.