Used ADVANCED VACUUM Vision 320 #293814704 for sale

ID: 293814704
Reactive Ion Etcher (RIE) Strip.
ADVANCED VACUUM Vision 320 is an innovative etcher/asher equipment that combines cutting-edge technology with advanced features to provide precise and efficient processing of various materials. Designed for research and industrial applications, this system offers a range of capabilities for etching, cleaning, and surface modification of substrates in a vacuum environment. One of the key features of Vision 320 is its high-performance vacuum chamber, which is designed to create a clean and controlled processing environment. The chamber is equipped with a robust pumping unit that can achieve and maintain ultra-high vacuum levels, ensuring the removal of contaminants and impurities from the processing area. This vacuum capability is crucial for achieving precise and reproducible results in etching and ashing applications. The machine also features advanced gas delivery and control systems, allowing users to introduce a variety of gases into the chamber for different processing needs. The gas delivery tool is precision-engineered to ensure accurate flow rates and mixtures, enabling users to tailor the etching or cleaning process to specific material requirements. Additionally, the asset is equipped with mass flow controllers that provide real-time monitoring and adjustment of gas flows, further enhancing process control and repeatability. ADVANCED VACUUM Vision 320 incorporates a highly versatile plasma source that can be configured for various plasma-based processes, including reactive ion etching, plasma cleaning, and surface modification. The plasma source is capable of generating a high-density plasma with uniform distribution across the substrate surface, ensuring consistent and uniform processing results. Moreover, the plasma source is designed to be highly efficient, maximizing the etching or cleaning rates while minimizing damage to the substrate. In terms of user interface and control, Vision 320 offers a user-friendly software platform that allows for easy programming and monitoring of the model operation. The software interface provides intuitive controls for setting up processing parameters, monitoring process status, and analyzing data in real time. Additionally, the equipment is equipped with advanced diagnostic tools that enable users to troubleshoot issues and optimize process performance quickly. ADVANCED VACUUM Vision 320 is also designed with versatility and scalability in mind, allowing users to customize the system with additional accessories and upgrades to meet specific application requirements. The unit can be equipped with a range of substrate handling options, including robotic loaders and wafer mapping capabilities, to enable high-throughput processing of multiple samples. Furthermore, the machine can be integrated with other tools or instruments for in-situ monitoring and characterization of processed samples. Overall, Vision 320 is a state-of-the-art etcher/asher tool that offers unmatched performance, precision, and flexibility for a wide range of research and industrial applications. With its advanced features, high-quality components, and user-friendly interface, this asset provides a reliable and efficient solution for achieving optimal processing results in a vacuum environment.
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