Used ALCATEL / ADIXEN / PFEIFFER 601E #9267161 for sale

ALCATEL / ADIXEN / PFEIFFER 601E is an advanced etching/assembly instrument designed for the etching of silicon surfaces, metals, and semiconductor materials. This etcher is equipped with high-speed, high-precision, and high-throughput capabilities, making it ideal for research and development, advanced product development, and high-quality manufacturing processes. ADIXEN 601E is primarily utilized for the etching of semiconductor devices, using a three-step process. In the first step, the wafer is placed into the etching chamber and exposed to a high-intensity plasma. The plasma is then heated to a temperature of up to 200 degrees Celsius in order to remove the unwanted surface layer. In the second step, the etching process begins, utilizing a tailored etch process to etch the desired regions into the desired patterns and shapes. Finally, during the third step, the wafer is washed and cleaned to ensure the removal of the residual product. ALCATEL 601E features a wide range of advanced technologies to provide optimal performance. Its high-precision etching control equipment utilizes an advanced software to ensure precision in the etching process. The machine has full process control including temperature control, plasma power control, and ion beam parameters for etching. Additionally, the etcher is equipped with a high-throughput system, allowing for fast etching across a wide range of wafer sizes. 601E features sophisticated safety features, including an automatic shutdown unit that ensures the wafer is not damaged at any point during the etching process. Its advanced fire suppression machine provides an extra level of reassurance during the etching process. PFEIFFER 601E is capable of etching high-precision patterns with low defects in a variety of materials, including metals, semiconductors, and silicon. The etching results have excellent uniformity, allowing for the fabrication of high-quality, high-precision components. The etcher is easy to use and is highly reliable, making it an ideal choice for a wide range of research and development processes.