Used ALCATEL / ADIXEN / PFEIFFER A601 #293667511 for sale

ALCATEL / ADIXEN / PFEIFFER A601 is a plasma etcher/asher designed to etch, asher and profile the surfaces of a variety of materials. It has been developed by the leading plasma equipment manufacturer, ADIXEN, to provide one of the most powerful plasma etching/ashing devices on the market. ADIXEN A601 is designed for use in the semiconductor, microwave, MEMS and high frequency industries. It is an ultra-high-performance system capable of producing fast, accurate and reliable etching and ashing results. The unit also has a built-in process simulation function for continuous monitoring, allowing for the accurate etch/ash process control and process optimization. ALCATEL A601 offers automated and manual operation modes, as well as a wide variety of plasma recipes. It features high plasma uniformity, fast internal substrate temperature control and conditioning, low RF power levels, high V/I linearity and low operating temperatures. It is also equipped with a proprietary plasma source protection machine that provides intelligence and feedback to protect against plasma "overburn" and potential surface damage. PFEIFFER A601 is designed for the highest throughput output and works extremely fast. It has an innovative, flexible working area with a double walled chamber guard. The chamber can be opened and closed quickly for easy loading/unloading of substrates. The closed-loop matching network, high-precision touch panels and the antibacterial UHP chamber guard give A601 optimal performance and safety. ALCATEL / ADIXEN / PFEIFFER A601 also features a multi-step plasma etching/ashing program, which allows users to program multiple recipes into the tool and monitor multiple recipes at the same time. This allows for the etch/ash processes to be accurately controlled and monitored. ADIXEN A601's advanced high power plasma source changes the way plasma etching and ashing can be used to create precise nanostructure features in a variety of materials. ALCATEL A601's versatility can be used to etch, asher and profile thin films, silicon wafers, and other substrates. It is also ideal for etching MEMS-based structures, such as RF filters, waveguides, antenna patterns and much more. PFEIFFER A601's ultra-cut performance, accuracy, reliability and repeatability make it one of the most advanced plasma etch/ash process tools available on the market. It is a powerful and cost effective tool that offers the highest throughput and flexibility to create highly detailed and reliable etch/ash profiles.