Used ALCATEL / ADIXEN / PFEIFFER AMS 200 #9229760 for sale

ALCATEL / ADIXEN / PFEIFFER AMS 200 is an ultra high vacuum etcher/asher known for its high precision abilities. This equipment is often used for complex etching and ashing processes in a variety of industries and research applications. The atomic force microscope in ADIXEN AMS 200 has a very high resolution and can be used for searching and imaging samples. Its high resolution makes it suitable for a wide range of applications, from IC systems to nanoparticles. Additionally, its sputter ion source can efficiently control the ion beam to craft perfect structures on sample surfaces. The sample treatment in ALCATEL AMS 200 is characterized by a high level of flexibility and reproducibility. The temperature and process pressure can be precisely adjusted and guaranteed regardless of the process pressure or sample size. Surface properties are achieved by the use of in-situ plasma treatments that allow for oxidation of the sample surface. This reduces the risk of surface contamination and improves adhesion for the etching and ashing process. The etching process in AMS 200 uses an oxide mass gaseous etching plume allowing for a delicate and minimal damage to the wafer surface. Etching is performed under high vacuum, where the ions sputtered from the sample surface are faster to reach the highly reactive oxygen species. This results in more uniform etching and minimal damage to the sample material. Likewise, the ashing process in PFEIFFER AMS 200 is performed under high vacuum. Utilizing its combination of reactive oxygen species and high process pressure, the ashing process is optimized to quickly and efficiently remove material from the surface with minimal damage. ALCATEL / ADIXEN / PFEIFFER AMS 200 also features a sophisticated temperature control system. This allows the user to adjust the temperature of the process chamber or of specific modules or parts. The temperature is held constant even with varying process pressure. In conclusion, ADIXEN AMS 200 is an ideal solution for processes requiring ultra high vacuum etching and ashing. Its combination of advanced technologies, including the atomic force microscope and in-situ plasma treatment, ensures consistent and precise results. Additionally, the temperature control system ensures minimal damage to the sample material, making it an ideal choice for a variety of applications.