Used ALCATEL / ADIXEN / PFEIFFER AMS 200 #9269458 for sale

ALCATEL / ADIXEN / PFEIFFER AMS 200 is an advanced, integrated etching / asher technology designed specifically for material processing applications such as reactive ion etching (RIE). It is a flexible equipment that offers users the choice of three etching technologies in a single platform. This flexibility and high-end performance make ADIXEN AMS 200 an ideal choice for advanced processes such as plasma-assisted etching (PAE), chemical mechanical polishing (CMP) and lithography. One of the system's key features is its integrated design, allowing users to access the chamber, generator, and power supply simultaneously. The unit offers low power consumption and minimal maintenance. It has a computer-controlled operating machine that allows for automated processing. The tool also supports a range of materials such as metals, oxides, nitrides and plastics. ALCATEL AMS 200 can process a wide variety of materials in both standard and production modules, and features an advanced servo-driven asset for uniform etching and processing. The model offers high-resolution scanning and deposition capabilities in a single platform, while its integrated control equipment allows users to quickly set process parameters for automation and repeatability. The system is also optimized for a shorter process time than traditional etching processes. The unit provides excellent process control through a built-in gas and liquid manifold. This allows users to precisely set the gas pressure, flow rate, and etch parameters for a variety of processes such as chemical vapor deposition (CVD), ion milling, laser ablation, and electrochemical etching. PFEIFFER AMS 200 also incorporates an advanced RF generator with optimized impediment matching, pulse frequency modulation (PFM), pulse-width modulation (PWM), and pulse-doped amplifiers. This provides greater control and higher precision for etching processes. The machine includes a comprehensive range of features from a built-in cooling tool for improved thermal stability to a high quality gas inlet asset. This helps to ensure that users can safely maintain etching and picture quality. Overall, AMS 200 offers robust etching capability in an integrated, flexible model designed specifically for a variety of material processing applications. By combining low power consumption and easy-to-use controls, the equipment is an ideal solution for precision etching and image processing.