Used ALCATEL / ADIXEN / PFEIFFER AMS 200 #9315005 for sale

ID: 9315005
Vintage: 2006
Etcher Missing parts: Computer Generator 2006 vintage.
ALCATEL / ADIXEN / PFEIFFER AMS 200 is an advanced plasma asher/etcher used in industrial etching processes. ADIXEN AMS 200 is specifically designed to be used in demanding production demands, providing precise and reliable etching with a high repeatability rate. It offers industry-leading etch rates and provides accurate control over etch rate, temperature, and etch time. ALCATEL AMS 200 has a smart user interface, allowing for easy setup and operation. It facilitates quick process optimization, as well as fast tuning of parameters in both manual and automatic mode. The onboard process monitoring and diagnostics ensure accurate results and process stability. PFEIFFER AMS 200 also features a unique etch control which accurately controls the shape of the etched profile. AMS 200 is equipped with an advanced control system which is designed to manage multiple process recipes. It also includes various analysis and data management options, such as analysis of etch characteristics and uniformity. ALCATEL / ADIXEN / PFEIFFER AMS 200 can be used in both dry and wet etching processes. ADIXEN AMS 200 offers various options when it comes to gas control, including variable/constant flow regulators, as well as digital gas valve controllers. In addition, the unit has an onboard gas mixing and delivery system allowing for accurate and repeatable gas mixtures. ALCATEL AMS 200 even has an optional vacuum port for post-etch gas evacuation. PFEIFFER AMS 200 has an opening for multi-level loading techniques, such as post-etch chemical maintenance. This makes it easier to achieve process optimization across multiple substrates and chamber configurations. Overall, AMS 200 is an advanced etching system offering precise, reliable, and repeatable etching. It provides industry-leading etch rates, as well as comprehensive onboard gas control and precise control over etch rate, temperature, and etch time. The unit is suitable for various etching processes, including dry and wet etching, and offers various features designed to facilitate quick optimization and uniform results.
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