Used ALCATEL / ADIXEN / PFEIFFER GIR #9092919 for sale

ALCATEL / ADIXEN / PFEIFFER GIR is a high vacum dry etching equipment designed for advanced process and reactive ion etching (RIE) in sub-micron feature sizes. This system is capable of etching in-depth down to 0.01mm and with accuracy up to 0.1mm. ADIXEN GIR unit also features a gas delivery machine with four gas lines allowing for different process combinations such as O2/CHF3 and Ar/Cl2. ALCATEL GIR tool includes a vacuum chamber, an insertion device, a controller unit, and a pumping station. The chamber is equipped with at least one turbo pump and one rotary vane backing pump to reach the required vacuum level of 10-6 mbar. The high-performance process pump together with the turbomolecular pumping asset ensure a uniform and stable gas flow throughout the process. The insertion device allows to place the sample into the chamber safely and is designed to avoid contamination of the vacuum chamber. The process gas flows through the controller which combine and characterize the flow rate of each gas present. The process gas is then sent to the injection valve that allows for uniform gas distribution into the process chamber. GIR model features a smart process control that monitors all the needed parameters such as temperature, pressure, and visibility. The equipment can be programmed with different etch recipes using the intuitive graphical user interface. Furthermore, PFEIFFER GIR includes a variable frequency RF power generator capable of delivering 20 Watts of in-situ RF power to optimize the etching process parameters as well as a 3D scanner for precise metrology measurement and positioning. Finally, ALCATEL / ADIXEN / PFEIFFER GIR etching system includes an advanced safety program to ensure a safe operating environment. The unit has a built-in temperature over-limit detector with automatic shut-off and provides additional alarms for safety related features. ADIXEN GIR also includes an internal flame detector. In summary, ALCATEL GIR is an advanced, high-performance etching machine designed for sub-micron feature size etching. It is equipped with multiple gas lines and provides intelligent process control for accurate and safe etching processes.