Used AMAT / APPLIED MATERIALS 0020-89006 #167778 for sale

ID: 167778
Lower lamp gold reflector ring Other Part #: AMP-357-002 Description: 12-Position Lower Reflector Ring Position Count: 12 Positions Finish: Gold Plated Height: 2.50" Inside Diameter: 11.00" Position Hole Diameter: 1.25" to 1.625" Total Weight: 6.45 lbs.
AMAT / APPLIED MATERIALS 0020-89006 is an advanced etcher/asher for semiconductor manufacturing. This etcher/asher utilizes cold-plasma technologies to process thin-film substrates. The equipment features planar and 3-D patterning capabilities to etch and asher thin-film substrates to submicron precision with repeatable uniformity. The components of the system include an etch chamber with loadlock, an asher chamber with loadlock, a pump station, a chamber for integrated filter/purge, an inert gas supply, a precision alignment unit, a pneumatics module, a power supply, an ex-situ vacuum priming machine, and a vacuum interlock. The tool is designed to provide greater asset throughput and utilization with improved production yield and reduced substrate damage. This model is able to handle up to 6-inch wafers, and has a process control module with multiple recipes and 250 steps per recipe. It is designed to support multiple thin-film etching and substrate treatment processes including but not limited to dielectric etching, CMP surface planarization, electrostatic plasma cleaning and conditioning, sputter etching, conformal coating, oxidation/nitridation and high temperature annealing. The equipment features a host of features to ensure accurate processing and uniformity including wafer chucking torque and control, coolant manifold pressure control, autofocus capability for depth of focus control, the ability to adjust the process conditions and power levels, in-situ measurement capabilities for monitoring critical process parameters, and integrated clean-chamber for protecting against contamination. AMAT 0020-89006 is an industry grade etcher/asher system that provides high-level precision with repeatable uniformity. Its advanced features provide efficient processing and ensures uniformity and accuracy for production quantity runs. Its sophisticated unit provides expansive capabilities for thin-film etching and thin-film processing. This machine is the perfect solution for production semiconductor manufacturing applications.
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