Used AMAT / APPLIED MATERIALS 8100 #293645356 for sale

AMAT / APPLIED MATERIALS 8100 etcher / asher is a equipment designed for high-productivity nanometric etching and ashing of semiconductor devices. AMAT 8100 etcher / asher contains a ColdWall™ processing chamber capable of processing substrates up to 200mm in size at temperatures of up to 300C. The system uses inductively-coupled plasma technology for faster and more uniform etching of various materials. This allows for cycle times well below 1 minute in ashing and etching tasks. APPLIED MATERIALS 8100 etcher / asher also features a dual barrel transport mechanism for automated loading and unloading of substrates. The dual barrel design facilitates faster loading and unloading, and improved flexibility for running multiple recipes. 8100 etcher / asher supports process recipes and compatible etch gases for many of the commonly used materials such as silicon, silica, aluminum, tungsten, dielectrics and more. The unit offers a range of physical process control variables such as pressure, plasma power, and process gas flow, enabling user flexibility in etching. AMAT / APPLIED MATERIALS 8100 etcher / asher also provides powerful data logging and analysis capabilities, as well as a comprehensive recipe library that allows users to create, store and manage customized recipes, accelerating the setup and execution of processes. AMAT 8100 etcher / asher is an ideal machine for applications such as via filling, contact hole etching, and anti-reflective coating removal. The tool is designed to provide excellent process repeatability and performance. The user-friendly design and flexibility make it suitable for a wide range of process applications, allowing users to achieve maximum etching and ashing productivity.