Used AMAT / APPLIED MATERIALS 8110 #9144929 for sale

AMAT / APPLIED MATERIALS 8110 (AMAT) etcher / asher is a highly versatile, trusted etching and ashing equipment ideal for the deposition, wafer cleaning and etching of passivation layers, dielectrics and metal materials. AMAT 8110 features a highly efficient, low temperature plasma source, which enables controlled and repeatable etching processes. With its efficient and balanced reactive ion beam/gas flow feature, APPLIED MATERIALS 8110 offers excellent control over etching process parameters and chamber conditions. Its simple user interface and highly efficient operation make it feasible to use 8110 even with less experienced operators. AMAT / APPLIED MATERIALS 8110 is also capable of performing high-speed etching, high selectivity etching and dry cleaning of metals, dielectrics, and passivation layers. AMAT 8110's etched and ashed substrates have excellent processing uniformity and wafer surface quality. The uniformity is achieved through a balanced, three-zone etch processing. APPLIED MATERIALS 8110 also features a high-sensitivity in-situ end-point detection to monitor etch rate and downstream contamination from over etching. It also provides an etch stop function which allows users to precisely terminate etching processes. 8110's plasma source also provides uniformity in etch rate and temperature distribution, which makes it suitable for large-scale production lines. Additionally, AMAT / APPLIED MATERIALS 8110 enables very fast process cycle times through a rapid, set up and tuning of etching gases. Furthermore, the system comes with a number of built-in safety features including an overpressure cutting unit, an overpressure sensing switch, and a cooling machine to protect wafers from thermal stress during etching. AMAT 8110 is also built with reliability and easy maintenance in mind which makes it a reliable workhorse. Its five easy-to-change vacuum pumps make maintenance easier, while its automatic vacuum tool keeps maintenance hassle-free. Furthermore, its automated cleaning asset allows users to quickly and easily remove contamination in the chamber. APPLIED MATERIALS 8110 etcher / asher is an effective, highly versatile model designed for the etching and ashing of metals, dielectrics, and passivation layers. It features a low-temperature plasma source, uniform etch rate and temperature distribution, high selectivity etching, in-situ end-point detection, overpressure cutting equipment, and other safety features to ensure reliable processing. Its user-friendly interface and easy maintenance make it a reliable workhorse that helps users quickly and accurately complete tasks in a wide range of process steps.