Used AMAT / APPLIED MATERIALS 8110 #9269146 for sale

AMAT / APPLIED MATERIALS 8110
ID: 9269146
Wafer Size: 5"
Etchers, 5".
AMAT / APPLIED MATERIALS 8110 is an etcher/asher that provides superior plasma etching performance, achieving superior process quality and repeatability. It is a one-of-a-kind equipment capable of etching a large variety of materials. The system is equipped with two independent Premium Controllers and two substrate chucks, which are designed to run multiple materials and process recipes. AMAT 8110 unit features a high-throughput, high-volume production process for all etch operations in a wide range of applications. The high-performance chambers accommodate all substrate sizes and come pre-configured with an APM 1700 or 1400 feed machine (for larger volumes). APPLIED MATERIALS 8110 also includes an advanced digital tube furnace and massive exhaust cooling tool, enabling fast ramp rates and deep etch performance. 8110 offers superior repeatability with integrated process monitoring tools such as traceable files, parameter files, and process monitors. This ensures consistent asset output and performance. The digital tube furnace enables rapid temperature ramps and minimizes variability in critical parts of the etch process. AMAT / APPLIED MATERIALS 8110 features a flexible electrode design that enhances process control and repeatability while offering superior flexibility due to its three etch electrodes. AMAT 8110 also has a variety of controls, including a dynamic pressure controller, oxygen and fluorine flow control, and an arc voltage regulation. This allows users to tailor the etch processes and tune the process to the best results possible. APPLIED MATERIALS 8110 can be used to etch metals, polymers, insulators and semiconductors, offering competitive performance on each material type. Finally, 8110 can be integrated into existing cell architectures and paired with other AMAT equipment as part of a complete model configuration. AMAT / APPLIED MATERIALS 8110 is the perfect etcher/asher for high-performance etch applications. Its advanced technology and design provide superior etch performance, repeatability, and control for all material types. This user-friendly equipment provides users with the highest levels of process performance and productivity.
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