Used AMAT / APPLIED MATERIALS 8116 #9250130 for sale

AMAT / APPLIED MATERIALS 8116 is a type of etcher/asher designed for semiconductor device fabrication. It is a single-wafer plasma etcher/asher equipped with highly programmable controls and high uniformity. AMAT 8116 is primarily used in integrated circuit (IC) device production. APPLIED MATERIALS 8116 uses RF power to create a relatively low-temperature plasma around the device which is then used to etch away layers of material. 8116 utilizes a metal-shielded (MS) chamber design which optimizes the plasma uniformity by minimising RF power leakage. The chamber also utilizes parallel-plate electrodes to ensure uniformity and matched plasma density across the diameter of the wafer. This feature allows for small isolated areas to be accurately fabricated to even the smallest specifications. AMAT / APPLIED MATERIALS 8116 also features ultra-high-vacuum (UHV) mechanical pumps that allow for the processing of high-performance materials such as Ge/Si and SiGe/Si. Moreover, due to its high accuracy gas delivery systems, AMAT 8116 is capable of achieving exact process conditions needed for accurate etching operations such as pulse and spin-etch. Other advanced features such as adjustable slit and adjustable showerhead height allow precise control over the etch geometry and uniformity. APPLIED MATERIALS 8116 is turnkey-ready and delivers superior performance and reliability. By utilizing pulse technology, it is possible to achieve minimum feature sizes of nanometers and sub-microns with a high throughput. 8116 is IGBT-based and is powered by a scalable power supply which can be adjusted for a specific etch process. Its excellent plasma uniformity, low operating costs, and flexibility make it an ideal choice for advanced device manufacture.