Used AMAT / APPLIED MATERIALS 8300 #9261704 for sale

AMAT / APPLIED MATERIALS 8300
ID: 9261704
Poly etcher.
AMAT / APPLIED MATERIALS 8300 Asher / Etcher is a high performance tool that enables users to quickly produce highly precise structures and surfaces for many applications. The equipment has a variety of features designed to enhance performance, versatility, and safety. AMAT 8300 Asher / Etcher is based on a low-cost, single-ended ultra-high frequency radio-frequency (UHF-RF) generator and is capable of 1000 watts of heating power. It has a working pressure of 10 - 500 mBar, and is programmable to run up to 12 different recipes simultaneously. The system is compatible with both gas and liquid etching media. APPLIED MATERIALS 8300 Asher / Etcher features a high-precision XY axis movement unit for precise surface deposition of the substrate. It also has a fine z-axis approach that enables easily adjustable layer height control. It also uses an independent high-frequency internal reflectometer to provide real-time feedback on the substrate's reflectivity. 8300 Asher / Etcher is engineered for process development as well as production of medium to large parts. It features a 12-inch insulated chamber, ample space for loading in large products, and a color touch display that monitors the plasma process parameters in real-time. It also has a linear glass door for easy loading and unloading of substrates. AMAT / APPLIED MATERIALS 8300 Asher / Etcher incorporates a unique safety locking machine, designed to prevent accidental operation, and an automatic abort tool that detects hazardous conditions within the chamber. This asset also provides electronic monitoring and control of the process parameters, ensuring the production of high-quality parts. AMAT 8300 Asher / Etcher can be used for etching and ashing of substrates made of diverse materials, such as inorganic, semiconductor, and carbon-based materials. It provides a high degree of process control, allows for easy recipe changes, and provides precise surface deposition. This model is an ideal choice for many different etching and ashing applications.
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