Used AMAT / APPLIED MATERIALS 8310 #9196363 for sale
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ID: 9196363
Wafer Size: 6"
Metal etcher, 6"
With pump
RF Rack and controller
AMAT Controller unit
AMAT 0010-00141 Rack, 8300E
LEYBOLD HERAEUS
Type: 720-26-000
Chamber: AMAT Pre-reactor.
AMAT / APPLIED MATERIALS 8310 Asher is an integrated etch equipment used for both substrate cleaning and etching processes. Designed for high performance, the etch system features a 300mm wafer size. The etcher has a high throughput of up to 30 wafers per hour, making it excellent for production environments. The unit is flexible in the etching gases it can use and is able to reach temperatures up to 500°C due to its hot plate design. It is equipped with a Class-1 safety chamber and offers good thermal uniformity with a maximum temperature variation of 1°C. AMAT 8310 Asher uses a high-precision emboss mechanism for precise etching of thin films. It is designed with robust hardware and software capability, allowing users to easily adjust pressure and gas concentration. Its advanced plasma machine reduces downtime and has improved plasma generation and processing capabilities, ensuring high quality and reliability. The etcher provides cycle times with increased speed and accuracy, reducing the amount of time needed for production. It is equipped with both a RF and DC power supply, allowing it to etch both high and low dielectric materials. The control software is designed to monitor each wafer during the etching process for uniformity and quality assurance. APPLIED MATERIALS 8310 is capable of handling and cleaning extreme contamination, enabling users to overcome process issues quickly and easily. The tool is capable of handling high levels of static and field particles, providing improved cleanliness and improved yield. Overall, 8310 Asher is a high-performance etching asset that delivers high quality etching and cleanliness. It is easy to use and provides excellent thermal uniformity, making it an excellent choice for production environments which require high throughput and excellent etching quality.
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