Used AMAT / APPLIED MATERIALS 8330 #293619549 for sale

AMAT / APPLIED MATERIALS 8330 is an etcher or asher that uses microwave plasma enhanced chemical vapor deposition (PECVD) technology to deposit films of various oxides and nitrides on silicon and other substrates. AMAT 8330 provides a unique combination of capability, process uniformity, and flexibility to form films to any achievable thickness - from tenths of an angstrom to several hundred nanometers - enabling its use for a wide range of device and circuit fabrication. APPLIED MATERIALS 8330 is designed for high precision, controlled deposition of oxides, nitrides, and other thin films. It has a highly productive, ion-assisted electron cyclotron resonance (ECR) source. ECR sources provide enhanced power densities and uniform deposition rates, enabling 8330 to support multiple film depositions at the same time. AMAT / APPLIED MATERIALS 8330 is equipped with two energy coils (multi-source ECR technology) that can deliver up to 3.2 kW of power to each substrate simultaneously, which dramatically increases throughput. AMAT 8330 includes a variable-pressure, variable deposition configuration that enables users to shape the substrate surface prior to the coating of thin films. This equipment also features optimized control of the etching and deposition process for optimal film deposition, uniformity, and speed. Its chamber has reduced wall reactive species and chamber particle deposition, which further enhances process repeatability and uniformity. In terms of environmental management, APPLIED MATERIALS 8330 is designed to meet a variety of environmental compliance standards, including RoHS, REACH, and SASO. This equipment is designed to operate at temperatures ranging from 25 to 350 degrees Celsius, offering superior temperature control for the deposition of thin films and to maintain uniformity. Moreover, 8330 is integrated with a range of additional features that allow users to store their process recipes and increase process flexibility. This system is also compatible with a variety of computer-aided design (CAD) and computer-aided engineering (CAE) systems, including AutoCAD, and P&E, allowing users to access and design the process recipes. In conclusion, AMAT / APPLIED MATERIALS 8330 is a high-performance etching and deposition system capable of providing superior thin film deposition capability, uniformity and control. Its controlled environment and powerful ECR source, provide enhanced process control, while its multi-source capabilities enable multiple film depositions at the same time. AMAT 8330 is also integrated with a multitude of features to ensure environmental compliance and ease of use.