Used AMAT / APPLIED MATERIALS 8330 #293652763 for sale

AMAT / APPLIED MATERIALS 8330
ID: 293652763
Wafer Size: 6"
Etchers, 6".
AMAT / APPLIED MATERIALS 8330 (AMAT 8330) is an etching/ashers equipment used in the fabrication of integrated circuits, thin-film transistors, and other technologies. It is a platform-independent system that can be modified to work with a variety of film-processing chemistries such as silicon, tungsten, and aluminum. APPLIED MATERIALS 8330 unit is an advanced model featuring a large chamber capable of etching/ashing substrates up to 375mm in diameter. It uses a high-pressure dry-etch technology, allowing users to achieve high resolution and aspect ratio etch with minimal damage to the fragile substrates. It has a Xenon lamp-based optical machine, allowing excellent contrast between the film and substrate. 8330 provides excellent process performance, thanks to its fast thermal cycle times, a high-pressure reactive ion etching technique for high etch rate and precision, and a large chamber size to accommodate larger substrates. It offers a small chamber design for reliable, low-defect processing, and adjustable temperature control for precise control over the etch parameters. The tool also offers excellent process uniformity, enabling the user to achieve uniform aspect ratios and surface finish across the entire wafer surface. Additional features of AMAT / APPLIED MATERIALS 8330 asset include a variable frequency plasma source for greater etch selectivity and a computer-based control model to simplify operation, as well as Ethernet capability for remote machine monitoring and controlling. It also features a built-in heating element for pre-processing operations, a hydrochloric acid filtering equipment for waste collection, and a cold trap for efficient vacuum filtration. The system is designed for maximum versatility and designed for ease of maintenance and serviceability. Overall, AMAT 8330 is an advanced etching/ashers platform that provides exacting etch results on a variety of substrates. Its features make it ideal for the production of integrated circuits, thin-film transistors and other technologies. It has been designed to provide reliable, uniform results, while minimizing damage to delicate substrates. With its advanced computer-based control and Ethernet capabilities, it is an ideal unit for many different applications.
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