Used AMAT / APPLIED MATERIALS 8330 #9068913 for sale

AMAT / APPLIED MATERIALS 8330
ID: 9068913
Wafer Size: 6"
Etchers, 6".
AMAT / APPLIED MATERIALS 8330 Asher / Etcher is a high-speed, dry chemical plasma etch tool used for the processing of device substrates and other components. AMAT 8330 Asher/Etcher provides a precisely controlled etching process utilizing an advanced chamber design. This etcher ensures a clean processing environment through the use of an innovative sealed chamber design. This Model APPLIED MATERIALS 8330 is a chemical-based etching machine that is equipped with a high-end plasma source. This plasma source enables the etcher to process substrates at high speeds, with precision and accuracy. It is designed with a number of advanced features such as auto-adjust, self-aligning and contouring functions, which allows the user to monitor process conditions in a variety of scenarios, such as in-situ repair and contamination control. 8330 Etcher/Asher is capable of processing substrates with a range of thicknesses and materials. The machine incorporates a unique RF plasma generator, as well as a quartz-interface chamber which creates an intense plasma stream that interacts with a substrate material. This combination allows the user to control the parameters necessary for high-resolution etching. The machine is capable of handling a variety of processes such as anisotropic etching, planar etching, deep etching and shadow mask etching. The machine is also capable of handling processes such as resistive layer removal. AMAT / APPLIED MATERIALS 8330 Asher/Etcher can also be used for advanced ion milling applications such as for reactive ion etching (RIE) and implantation. AMAT 8330 Etcher/Asher also provides users with the capability to conduct wet processes. It is equipped with an acid bath and a water jet sprayer for the proper cleaning of substrates. The etch chamber is designed for maximum safety, efficiency and quality control. APPLIED MATERIALS 8330 Etcher/Asher is built with a tight chamber design to ensure minimal particle contamination. The tight vacuum chamber design also allows users to etch under highly repeatable process conditions. The etcher is integrated with a digital display and pressure control system to provide accurate process monitoring parameters. The system is also equipped with a forward cryopump to maintain stable etch chamber temperatures. 8330 Asher/Etcher is a reliable and accurate etching tool that ensures precise substrate processing. The machine is capable of handling a wide variety of processes, and its advanced features allow users to achieve high-resolution etching results. The robust sealed chamber design of this system ensures a clean, consistent and repeatable environment for every etching project.
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