Used AMAT / APPLIED MATERIALS 8330 #9070196 for sale

AMAT / APPLIED MATERIALS 8330 etcher is a gas cluster ion beam (GCIB) based etch system that operates at low temperatures. This advanced equipment is specifically designed for high-throughput plasma etch processes and enables superior control over the etch configuration to enable a variety of applications. In comparison with other etch technologies, the GCIB offers improved edge profile control, less charging, improved cleanliness, improved uniformity, reduced damage, and more efficient etching. AMAT 8330 etcher has a 400 mm process chamber and is equipped with an automated macro lift for easy process load and unload. Its 1300 Watts of RF power ensures higher throughputs and exact profile control when etching. The etcher utilizes a wide range of gases, such as oxygen, chlorine, CF4, and CHF3, for various reactive ion etching (RIE) processes. The process parameters can be adjusted with precision, such as gas concentration, pressure, flow rate, RF power, and bias voltage. Due to its versatile process capabilities, APPLIED MATERIALS 8330 etcher can be used to etch various materials, such as silicon, silicides, polyimide, etc. This state-of-the-art equipment is ideal for applications in semiconductor manufacturing, such as chip interconnects, and complicated integrated circuits. It is also suitable for etching of advanced materials such as crystalline SiGe, III-V compound, SiNx, and nitride-based devices. 8330 etcher comes with a user-friendly graphical user interface which allows easy monitoring and adjustment of the process. It also includes an in-situ cleaning system that enables maintenance of a high degree of cleanliness in between the process runs. This results in reduced downtime and improved process stability and repeatability. The etcher is also equipped with predictive monitoring capabilities to provide real-time analysis of the etching process, ensuring smooth operation and maximum user convenience. In conclusion, AMAT / APPLIED MATERIALS 8330 etcher is an advanced piece of equipment designed for etching processes in the semiconductor technology industry. This low-temperature etcher offers superior performance, repeatability, and efficiency when processing a wide range of materials. Its user-friendly interface, in-situ cleaning system, and predictive monitoring capabilities enable smooth operation and optimum repeatability. Hence, AMAT 8330 etcher provides an efficient solution for various plasma etch processes.