Used AMAT / APPLIED MATERIALS 8330 #9269145 for sale

AMAT / APPLIED MATERIALS 8330 is a high performance plasma etcher specifically designed to etch the most difficult to etch materials and precision features. AMAT 8330 utilizes an advanced variable frequency ICP (Inductively-Coupled-Plasma) source which has a broad range of chemical reaction (etch) chemistry. This allows the flexibility to etch most materials without the need for additional tooling or set-up. APPLIED MATERIALS 8330 etcher controls feature an intuitive user interface that allows the operator to create custom etch recipes for different materials and features. The etcher can also be used to create a variety of patterns and shapes for photolithography processes. 8330 is equipped with an advanced, high resolution mass spectrometry system which provides feedback on the plasma chemistry. The system monitors the plasma chemistry and adjusts power levels to ensure uniformity across the etch chamber. AMAT / APPLIED MATERIALS 8330 also has a high repeatability rate to ensure consistent etching results in production. The constructed chamber of AMAT 8330 is designed to provide a low-temperature, low- pressure and clean environment with excellent mechanical and vibrational characteristics for etching. Additionally, the chamber is leak free and has an excellent surface finish for proper wafer bonding. APPLIED MATERIALS 8330 is capable of handling a wide range of wafer sizes, up to and including 8" wafers. This allows for a scalable etching operations for high volume production. 8330 is also capable of etching as thin as 200nm which is superior to many traditional wet etching processes. The total cost of ownership for AMAT / APPLIED MATERIALS 8330 is competitive with other etching systems on the market. The system is also designed to be operated in a wide range of environments and does not require significant external utility support.