Used AMAT / APPLIED MATERIALS 8336 #9226747 for sale

AMAT / APPLIED MATERIALS 8336
ID: 9226747
Wafer Size: 6"
Vintage: 1996
Oxide etcher, 6" 1996 vintage.
AMAT / APPLIED MATERIALS 8336 Etcher/Asher is a piece of equipment used by semiconductor and electronics manufacturers for the purposes of creating nanostructures of a desired shape and size from a variety of materials. This equipment is capable of producing structures from metals, polymers, resist materials, and dielectrics. AMAT 8336 Etcher/Asher can perform two major forms of etching techniques, including deep reactive ion etching (DRIE) and anisotropic etching. The ability to perform DRIE etching is key in the fabrication of MEMS (micro-electromechanical systems) and microfluidics, due to its high selectivity during etching. Anisotropic etching provides for a controllable etching rate by controlling the combination of the etching processes' parameters, like pressure, temperature, and usage of etchant gases. APPLIED MATERIALS 8336 Etcher/Asher is composed of two main chambers; a lower plasma chamber for etching and an upper load-lock chamber for accommodating wafers. The lower chamber utilizes a Faraday shield to protect the wafer being processed from arcing and other plasma-related problems, and it also features a ceramic separator which helps maintain a process chamber vacuum of up to 5x10-5 Torr. The upper chamber can hold a maximum of 15 wafers, and it is outfitted with a temperature-controlled cassette for accurate wafer loading and unloading. 8336 Etcher/Asher uses a three-step process for etching, whereby the wafers are coated with a photoresist layer, patterned with the desired design, and then etched using either a deep reactive ion etching (DRIE) or isotropic etching process. During the process, various gases are used, such as oxygen, fluorine and nitrogen, mixed in combination with RF power, which is adjustable between 0 to 300 Watts. AMAT / APPLIED MATERIALS 8336 Etcher/Asher also features an intelligent temperature control system that monitors and adjusts the temperature inside the process chamber, ensuring uniform heating throughout the operation. This system also includes an over-temperature protection feature, which can be set to abort the etching process in case of excessive temperature rises. AMAT 8336 Etcher/Asher includes additional components designed to improve the accuracy and quality of results, such as a viewing window for monitoring during the etching process, and the ability to save previous process settings for repeatable results. In addition, APPLIED MATERIALS 8336 Etcher/Asher is certified compatible with multiple safety standards, such as ANSI/IEEE/UL-CSA-499, UL-60079, and NFPA70. All of these features and safety considerations combine to make 8336 Etcher/Asher a reliable and efficient choice for etching and ashing operations.
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