Used AMAT / APPLIED MATERIALS 8336 #9250132 for sale

AMAT / APPLIED MATERIALS 8336
ID: 9250132
Wafer Size: 6"
Vintage: 1996
Oxide etcher, 6" 1996 vintage.
AMAT / APPLIED MATERIALS 8336 etcher/asher is a multi-purpose equipment designed for a variety of etching, cleaning and ashing processes. The system utilizes the latest RF plasma technology and provides the highest levels of uniformity and repeatability, allowing for tight process control and fast cycle times. The unit is composed of several components, including an RF Generator, an Asher Head/Tower, a Chamber/Process Vessel, Process Gases, and Vacuum Equipment. AMAT 8336's advanced RF Generator supplies process power to the Asher Head, which efficiently creates the plasma necessary for etching and cleaning processes. The chamber/vessel holds the wafer substrate and protects the Asher Head and the Process Gases from contamination. The user-controlled Process Gases are channeled through nozzles, controlled by the Asher Head, to coat the appropriate areas of the substrate. APPLIED MATERIALS 8336's Vacuum Equipment encompasses all components of the substrate chamber and maintains the vacuum environment, contributing to fast cycle times. 8336 can etch and clean a variety of materials, including silicon, polysilicon, glass, low-k dielectric, metals, resist, oxide, and nitride, allowing for precision processing. Its proprietary Cross-Ladder Technology supports higher throughput with extremely tight etch uniformity. Additionally, it can achieve high-aspect-ratio etching, up to 100:1, making it ideal for more advanced process applications. The machine also offers a range of process monitoring capabilities, including in-situ gas analyzers, endpoint detection, and wafer mapping to give users full control over their etching/ashing processes. In addition, the intelligently-controlled tool helps to minimize labor costs and reduce bottlenecks in the production process. AMAT / APPLIED MATERIALS 8336 etcher/asher is a reliable and versatile asset, capable of achieving accurate and repeatable etching and cleaning results with high-throughput performance. Its superior process control, advanced technology, and monitoring capabilities combine to ensure users the highest quality results while saving time and money.
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