Used AMAT / APPLIED MATERIALS Centris #9394694 for sale

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ID: 9394694
Wafer Size: 12"
Vintage: 2018
SYM3 Etcher, 12" Controller (2) External racks For main AC, system control, power supplies Front loader non-functional (6) Chambers: Chamber A1 Chamber A2 Chamber B1 Chamber B2 Chamber C1 Chamber C2 Power supply 2018 vintage.
AMAT / APPLIED MATERIALS / AKT Centris is an etcher and asher designed to provide high-precision wafer processing. The etcher is capable of clean and repeatable processing of different kinds of materials with low cost of ownership. AKT Centris Etcher utilizes a range of sophisticated process control technologies and materials-specific etching profiles for accurate etching each time. The equipment features a small form factor that maximizes utilization in a limited space and can handle multiple wafers of different sizes. AMAT Centris features a single integrated control system that is easy to operate and monitor. The controller combines manual and automatic precision chamber positioning, integrated isolation latches, visual environment monitoring, integrated temperature and pressure control and real-time process monitoring with graphics for unit status monitoring. This allows for precise process and machine control and segmented process chambers and dual thermal zone chambers that optimize processing performance. The tool is also equipped with Advanced Plasma Tracking (APT), which monitors the exact position of the etch and ashing process using a unique three-axis coordinate asset. This allows the etch to be precisely targeted to the substrate and eliminates target edge profile wandering during etching. The model also features Exactradd, a PC-controlled source etch matching equipment which optimizes resist layer profile data and matches targeted substrate etch layers. In addition, APPLIED MATERIALS Centris etcher has enhanced target profile optimization to allow process patterns to be accurately performed. Its fully enclosed all-metal construction makes it highly reliable and low maintenance. Dual enclosures with cascade filtration enables contamination-free, high-quality process results, even for batch-processing with long runs. Overall, the system provides high precision etching and ashing with quality repeatability and stable processing for semiconductor wafer processing.
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