Used AMAT / APPLIED MATERIALS Centris AP AdvantEdge GT #293637109 for sale

AMAT / APPLIED MATERIALS Centris AP AdvantEdge GT
ID: 293637109
Wafer Size: 12"
Etcher, 12".
AMAT / APPLIED MATERIALS Centris AP AdvantEdge GT is a high-performance etcher / asher equipment used in the semiconductor, MEMS, and microfabrication industries. It is designed to enable the precise etching of a wide range of materials, including silicon, steel, and aluminum. The system is equipped with an optimized gas unit that enables enhanced process control and flexibility. AMAT Centris AP AdvantEdge GT utilizes a multi-stage etch process to ensure precision results. It begins with a pre-processing step in which the material to be etched is prepared for the etching process. This is followed by the main etch step, which involves introducing gases into the process chamber and applying a high-powered plasma from an externally-mounted ion source. This plasma is used to etch away the material from the substrate. APPLIED MATERIALS Centris AP AdvantEdge GT can process both planar and non-planar surfaces for high-aspect ratio etching applications. The machine is designed to achieve ultra-high aspect ratio etching results of up to 20:1. It can also be used for advanced deep-trenching applications. The tool is highly automated and offers several process monitoring modes including load lock and mass flow. This ensures that the etch process is accurately controlled and monitored. Centris AP AdvantEdge GT can also measure the etch depth with depth sensor technology, ensuring that the desired etch depth is achieved. AMAT / APPLIED MATERIALS Centris AP AdvantEdge GT asset is optimized for optimal process reliability and repeatability. Its robust materials compatibility enables users to etch a wide range of materials with even greater accuracy. Additionally, it has an in-situ cleaning feature that allows users to clean the model while its running. In conclusion, AMAT Centris AP AdvantEdge GT is a high-performance etcher / asher equipment designed for the precision etching of a wide range of materials. The system utilizes a multi-stage etch process for ultra-high aspect ratio etching and deep-trenching applications. It offers automated process controls for enhanced accuracy, process reliability, and repeatability. With robust materials compatibility, APPLIED MATERIALS Centris AP AdvantEdge GT is an ideal etch solution for the semiconductor and MEMS industries.
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