Used AMAT / APPLIED MATERIALS Centris DPS MESA #9204005 for sale
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ID: 9204005
Etcher
Unit-EFEM:
Qty / Maker / Model / Ass'y / P/N
(1) / CYMECHS / Duraport / LPM / 104851
(1) / KAWASAKI / 3TT22013-A002 / Robot / -
(1) / KAWASAKI / 30D60E-A217 / Robot controller / -
Unit-Main power:
Qty / Maker / Model / Ass'y / P/N
(1) / - / Condor UVR AC Rack / AC Rack / 0195-06523
(1) / - / Remote AC Rack / AC Rack / 0180-04470
Unit-TM:
Qty / Maker / Model / Ass'y / P/N
(1) / BROOKS / ICP8 / Robot / 0031-00334
Unit-PM:
Qty / Maker / Model / Ass'y / P/N
(6) / AM AT / Mesa / ETCH CH / -
(6) / EDWARDS / STP-XA3203CV / TMP / -
(6) / EDWARDS / SCU-1500 / TMP Controller / -
(6) / VAT / Series651 / TGV / -
(6) / AE / Paramount3013 / Generator / -
(6) / - / Paramount1513 / - / -
(6) / AE / Navigator / Match / -
(6) / - / Navio / - / -
(84) / BROOKS / GF125CXXC / MFC / GF125C
AXIOM(ASP):
Qty / Maker / Model / Ass'y / P/N
(2) / AE / 3151802-003 / Power supply / 0920-00130
(2) / MKS / VODMC33CRIBE / Vapor on demand module / -
ICP Source:
HW Component / G5 / G5 Minos / G5 Mesa
Lid heater / C-Shaped / O-Shaped / O-Shaped
RF Feed / Standard / Standard / Concentric
FE-ICP Field enhanced ICP / N.A. / Add on / Built-in integrated part of the design
Inner / Outer coils current phase / Single-mode in / Single-mode in / Dual-mode in-phase / Out-of-phase
Grounding plate / Standard / Standard / Symmetrical
RAD Radial assembly dial / Optional / Optional / Motorized - MRAD integrated part of the design
Cathode:
ESC / G3 / G3.9 / G3.9
RF Feed / Standard / Concentric / Concentric
Plasma screen / Standard / Flow equalizer / Flow equalizer
LPM:
CYMECHS Duraport 104851
EFEM Robot:
KAWASAKI 3TT22013-A002
EFEM Robot controller:
KAWASAKI 30D60E-A217
RF Generator:
ADVANCED ENERGY Paramount3013 0190-33822-001
ADVANCED ENERGY Paramount3013 0190-33823-001
Source match:
ADVANCED ENERGY Navigator 0190-28484-001
ADVANCED ENERGY Navio 0190-28484-001.
AMAT / APPLIED MATERIALS Centris DPS MESA is an etcher/asher used for critical semiconductor etching/ashing processes. It is an automation-ready tool that meets global requirements for accuracy, repeatability, and security, supporting multi-vessel and multi-zone operations. AMAT Centris DPS MESA utilizes an advanced Ozone Delivery Equipment (ODS) and Dual-Plasma Self-Aligning (DPSA) technologies, allowing for precise etching and ashing of the most complex features on semiconductor wafers. The DPS MESA has advanced temperature control to achieve an optimal thermal profile throughout the process, and its unique options for automation and traceability help to improve throughput and maximize fab utilization. The tool's automated process control system allows for robust monitoring and control of the process, enabling faster etch rates and better process accuracy. An advanced gas cabinet for the rapid switching of gases, as well as an integrated direct-drive liquid controller, offer consistent etch results and minimized process drift. The DPSA feature also allows for composite etch/ash operations that can be precisely tailored for customer applications. The unit's high vacuum capabilities ensure a clean and repeatable process. The integrated advanced evacuation machine removes most of the gas and fumes created during the etch/ash process, and the powerful roughing and diffusion pumps reduce process cycle times. The tool is designed to be integrated into a cluster tool, allowing for simultaneous processing of multiple wafers, and the optional pre-mapping asset enables optimal sample placement for faster throughput. The model's integrated generator permits remote control of the unit, and its advanced safety features protect users during operation. Overall, APPLIED MATERIALS Centris DPS MESA provides an efficient and versatile etching and ashing solution for semiconductor fabs. Its advanced technologies, top-notch equipment safety and automation, and high productivity are unparalleled in the industry, making it an ideal choice for any semiconductor application.
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