Used AMAT / APPLIED MATERIALS Centris SYM3Y Poly #293625534 for sale

AMAT / APPLIED MATERIALS Centris SYM3Y Poly Etcher/Asher is a equipment designed to provide high-precision etching and ashing processes. This system utilizes reactive-ion etching (RIE) and inductively-coupled plasma (ICP) etching capabilities to produce high-quality results with extremely low temperature and minimal sample damage. The ICP etching technique can be used for a range of applications, such as deep reactive-ion etching (DRIE), creating patterned surfaces, or etching structures into substrates. It combines high etch rates, excellent etch selectivity, and a good filling factor to ensure high-precision patterns and etch depths. Additionally, the unit is equipped with a coaxial nozzle asher, providing a uniform, low temperature ashing process that avoids sample damage. AMAT Centris SYM3Y Poly Etcher/Asher runs an innovative controller and software suite that allow for fine-tuning of etch and ashing parameters, including etch depth and reactant composition, pressure and flow, substrate bias and power levels, and etch time. The controller also features embedded process locks, which enables the operator to set a maximum pressure and flow rate to prevent damage to samples. The user interface is intuitive and user-friendly, allowing for quick programming of parameters as well as reporting and data logging. APPLIED MATERIALS Centris SYM3Y Poly Etcher/Asher offers excellent temperature uniformity throughout the entire etching and ashing chamber, ensuring consistent results regardless of substrate size. The machine is designed to reduce contamination and cooling time and is compatible with a variety of process gases, including fluorine-based, chlorine-based, and nitrogen-based species. It also uses a proprietary containment technology with a 200 mm etch radius and multiple containment cells to ensure that etch and ashing chemicals are contained, leading to reduced process costs. In addition, the tool includes user-defined safety interlocks, reducing the risk of accidental chemical exposure. Overall, Centris SYM3Y Poly Etcher/Asher is an innovative asset that offers robust etching and ashing capabilities for a wide range of applications. It combines a sophisticated, user-friendly controller and software suite with an innovative chamber design and containment model, providing superior results with reduced contamination and cooling times.