Used AMAT / APPLIED MATERIALS Centris #9294774 for sale
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ID: 9294774
Wafer Size: 12"
Vintage: 2010
Polysilicon plasma etcher, 12"
0190-33716 SINFONIA SELOP 7 Corrosion resistant
(4) Load ports, 12"
(2) 0190-34832 FI Robots
KAWASAKI TX210
0190-32011 MF Vacuum robot drive assembly
FX Robot
Missing parts:
AC Rack
Aligner
2010 vintage.
AMAT / APPLIED MATERIALS / AKT Centris is an advanced etcher/asher, designed for the fabrication of intricate patterns in materials such as ceramics, glass, metal, polyimide and Si-silicon. The device is composed of two main components - the first is a gas source, typically O2 or molecular fluorine (F2), and the second is a heat source. The dual capability comes from the use of two electrode plates, which allow for variable adjustment of the applied voltage. For material processing, AKT Centris employs a plasma-assisted release method. This involves using plasma to locally evaporate, break down, or abrade the material in contact with the surface of a wafer. This ensures that complicated patterns can be etched or ashed onto these substrates while avoiding damage to the surrounding areas. With this method, high-quality, intricate patterns can be produced, allowing for the rapid production of unique components. AMAT Centris also employs a number of process control parameters, including temperature, plasma gas pressure, and applied voltage. By controlling these parameters, the desired etching or ashing depths can be achieved. Additionally, the device works in both plasma-on and Plasma-off modes, allowing for more precise pattern creation. Additionally, the etcher has a number of process fencing and process time-out alarms, which help to ensure that patterns are created within the desired tolerances. In summary, APPLIED MATERIALS Centris is a highly reliable and precise etcher/asher that can be used to fabricate intricate patterns in materials such as ceramics, glass, metal, polyimide and Si-silicon. With its dual electrode plates and variable process control parameters, the device can ensure that intricate patterns are created precisely and consistently, helping to reduce material wastage during production. Additionally, the inclusion of process fencing and process time-out alarms helps to prevent process drift. As such, the device is a valuable tool in the production of intricate components.
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