Used AMAT / APPLIED MATERIALS Centura ACP DPN Gate stack #9289806 for sale

AMAT / APPLIED MATERIALS Centura ACP DPN Gate stack is an etcher/asher for processing a wide variety of substrates used in semiconductor device fabrication. The etcher is designed to deliver highly uniform etch depths and processes via dopant-selective plasma etching, using fluorine- and chlorine-based chemistry. It is capable of offering superior control over the etching process, as well as high material removal rates. This etcher features a low-pressure, low-energy capacitively coupled plasma (CCP) etch system with precise reactant control to ensure excellent etch uniformity and selectivity over different material types. This etcher also enables excellent control of etch chamber conditions such as pressure, gas distribution, and plasma power. With its advanced control parameters, the system provides a consistent etch performance with clean etched surfaces of uniform depth and sidewall smoothness. AMAT Centura ACP DPN Gate stack uses a patented Dual Particle Neutralizer (DPN) technology to deliver high bias voltages at very high frequencies without damaging substrate materials. The DPN technology also minimizes the arsenic contamination levels by eliminating the need for traditional ashing processes. The DPN process is also suitable for use with a range of substrates, such as polysilicon, aluminum, silicon dioxide, and gallium arsenide. In addition, the etcher is equipped with enhanced vacuum technologies that provide a clean-etch environment that reduces post etch cleaning times while maintaining etch quality. The etcher also allows for the precise control of the pressure profile, which prevents damage to the gate stacks. The etcher also offers dynamic gas control and ultra-fast switch times that enable a wide process window. Additionally, specialized remote torches provide precise uniformity control, even in difficult-to-etch areas. Finally, APPLIED MATERIALS Centura ACP DPN Gate stack also provides safety features such as anti-reflective and light-scattering protective shields for the etch chamber. Thanks to its precise control parameters and advanced safety features, this etcher can deliver high-precision etches while minimizing the possibility of substrate damage.